IMS (Integrated Manifold System) is an advanced fluid delivery system currently employed in high volume manufacturing, wet semiconductor processes including Clean, Wafer Track, Electroplating, Deposition, etc.
IMS is based on Ichor’s pioneering surface mount gas delivery architecture that is field proven in decades of service for the management of gases to Semiconductor Etch and Deposition processes
While based on proven gas delivery architecture, IMS is optimized for the unique challenges of process fluids with patented sealing and interface features, chemical blending technology, and chemical resistant wetted path materials
