Understanding the Stability, Repeatability, and Accuracy of MFC Technologies in the Industry
Ichor Systems performed evaluations of various MFC technologies using SEMI standard procedures, and presents results here from the data we collected. The focus in the paper is on mass flow control devices and their role in semiconductor device processing relative to the stability, repeatability, and, ultimately, the accuracy of current Mass Flow Controller (MFC) technologies. Understanding the cause-and-effect-produced variability of current reactant flow technology, particularly for pulsed etch (Atomic Layer Etch) and pulsed deposition (Atomic Layer Deposition) nanoscale dry processes, enables capital equipment engineers to holistically design gas delivery systems that reduce and eliminate stochastic process errors.
About Ichor AFC
Ichor’s Advanced Flow Control (AFC) is highlighted as the leading technology in the technical paper, "A Holistic Approach Toward UHP Gas Delivery System Design Reduces Stochastic Variability Of Reactant Distribution In Plasma Etch And Deposition Equipment." Utilizing Ichor’s global manufacturing, gas panel and component engineering, the AFC next generation gas panel provides not only best in class performance, but also cost reduction at the gas panel level.
Sean Penley, Ph.D., Steven Wozniak, Chris Davis, Phil Barros